A new panel titled ‘Adorn and Subvert: A Discussion on Wearable Resistance’ will take place at NYC’s 117 Beekman Street as part of the Making Patterns exhibition on August 19.
Moderated by writer Joanne McNeil, the discussion examines the potential of the speculative designs of fashion to become the first line of resistance to counter oppression, harassment, and surveillance and to shift power dynamics.
Participating in the panel are artist, creative producer and researcher working in sound, performance and “the future of fashion” Lisa Kori Chung, artist and technologist Adam Harvey, and designer Iltimas Doha.
See the event page for details. **
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